imultaneous Monitoring of Bias, Linearity, and Precision of Multiple, Measurement Gauges

• Autores: Tee-Chin Chang
• Localización: Journal of quality technology: A quarterly journal of methods applications and related topics, ISSN 0022-4065, Vol. 40, Nº. 3, 2008, págs. 268-281
• Idioma: inglés
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• Resumen

  • A Shewhart charting scheme is investigated for simultaneous monitoring of multiple measuring gauges used for measuring a product or process attribute. This chart can identify any malfunctioning gauges that cause a shift in bias, linearity, or precision. An in-control state provides evidence that the gauges are functioning properly and are providing accurate measurements. The run length performance of the proposed chart is compared with that of a Shewhart charting scheme for measuring linearity between two measurement gauges. Applications of the proposed charting scheme are demonstrated with real manufacturing data sets.