Solvay and partners unveil ecoFluor project to cut emissions in semiconductor industry

• Autores: Liz Gyekye
• Localización: Industrial Minerals, ISSN 0019-8544, Nº. 579, 2016 (Ejemplar dedicado a: Enero)
• Idioma: inglés
• Texto completo no disponible (Saber más ...)
• Resumen

  • The three-year project will focus on new cleaning processes for chemical vapour deposition (CVD) chambers and replaces the three major cleaning gases, hexafluoroethane (C[subscript]2 F[subscript]6 ), tetrafluoromethane (CF[subscript]4 ) and nitrogen trifluoride (NF[subscript]3 ), with gas mixtures based on fluorine (F[subscript]2 ), nitrogen (N[subscript]2 ) and argon (Ar) mixtures.