págs. 579-580
W. J. Quadakkers, H. Nickel
págs. 581-587
H. Schmidt, G. Borchardt, P. Fielitz
págs. 588-591
SIMS investigation of CrN sputtercoatings
P. Ramminger, C. Heinisch
págs. 592-596
2D- and 3D SIMS investigations on hot-pressed steel powder HS 6-5-3-8
G. Pockl, M. Rosner, H. Danninger
págs. 597-601
Adhesion promotion of Cu on C by Cr intermediate layers investigated by the SIMS method
K. E. Mayerhofer
págs. 602-607
M. Kosec, B. Malic, C. Pollak, S. Javoric
págs. 608-613
TOF-SIMS and XPS-investigations of ion implanted single crystal 1b-diamonds
T. Fladung, V. Schlett, S. Dieckhoff
págs. 614-618
págs. 619-625
Non-destructive 3D-characterization of Zn~2~-~2~xCu~xIn~xS~2-thin films with ion beam analysis
D. Spemann
págs. 626-630
Electron probe microanalysis (EPMA) measurement of thin-film thickness in the nanometre range
M. Radtke, M. Krumrey, M. Procop
págs. 631-634
págs. 635-638
págs. 639-645
S. Oswald, D. Dobler, K. Wetzig
págs. 646-649
págs. 650-653
M. Friedrich, C. Himcinschi
págs. 654-657
T. Mutschler
págs. 658-664
págs. 665-671
págs. 672-675
Characterization of wet-chemically treated silicon interfaces by surface photovoltage measurements
H. Angermann
págs. 676-680
Characterization of laser-irradiated YNi~2B~2C surfaces by Auger electron spectroscopy
S. Baunack, A. Plotnikov
págs. 681-684
págs. 685-687
M. Hanbucken, A. Kraus, T. Koshikawa, H. Neddermeyer
págs. 688-694
Nanostructure and thermoelectric properties of ReSi~2~+~/~-~x thin films
D. Hofman, J. Schumann, C. Kleint, J. Thomas
págs. 695-698
Phase discrimination by automated BKD
R. Schwarzer
págs. 699-702
págs. 703-708
págs. 709-711
págs. 712-714
págs. 715-719
Kinetic aspects of the formation of aluminium oxide by use of a microwave-induced plasma
R. Hippler, H. Steffen, A. Quade
págs. 720-723
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