Degradation behavior and mechanism of polymer films for high-ohmic resistor protection in a heat and humid environment

• Autores: X. Y. Wang, H. Zhang, X.P. Ma, Q. Cheng, C.G. Li, M.X. Li, T.N. Chen, G.P. Zhang, J.Q. Shao
• Localización: Microelectronics reliability, ISSN 0026-2714, Nº. 57, 2016, págs. 79-85
• Idioma: inglés
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• Resumen

  • AbstracThe protection of polymer films is critical to the reliability of high-ohmic resistors working in a heat and humid environment, and temperature is the main factor resulting in failure of coated resistors. However, in this study hydrogen evolution reaction (HER) and corrosion reaction of OH− ions are found to be another two important factors determining the fate of coated resistors. When temperature effects can be neglected, corrosion resulted from OH− ions generated in HER may be the major reason of polymer degradation, the mechanism of which is discussed based on the polymer films mainly formed by phenolic and epoxy resins.