The three-year project will focus on new cleaning processes for chemical vapour deposition (CVD) chambers and replaces the three major cleaning gases, hexafluoroethane (C[subscript]2 F[subscript]6 ), tetrafluoromethane (CF[subscript]4 ) and nitrogen trifluoride (NF[subscript]3 ), with gas mixtures based on fluorine (F[subscript]2 ), nitrogen (N[subscript]2 ) and argon (Ar) mixtures.
© 2001-2024 Fundación Dialnet · Todos los derechos reservados