págs. 1-1
Active defects in MOS devices on 4H-SiC: A critical review
Hamid Amini Moghadam, Sima Dimitrijev, Jisheng Han, Daniel Haasmann
págs. 1-9
págs. 10-15
La2O3 gate dielectrics for AlGaN/GaN HEMT
J. Chen, T. Kawanago, H. Wakabayashi, K. Tsutsui, H. Iwai, D. Nohata, H. Nohira, K. Kakushima
págs. 16-19
págs. 20-24
Time dependent modeling of single particle displacement damage in silicon devices
Du Tang, Ignacio Martín, Chaohui He, Hang Zang, Cen Xiong, Yonghong Li, Daxi Guo, Peng Zhang, Jinxin Zhang
págs. 25-32
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págs. 41-47
Identification of the degradation state for condition-based maintenance of insulated gate bipolar transistors: A self-organizing map approach
Marco Rigamonti, Piero Baraldi, Enrico Zio, Allegra Alessi, Daniel Astigarraga Trespaderne, Ainhoa Galarza Rodríguez
págs. 48-61
M. Rutkauskas, C. Farrell, C. Dorrer, K.L. Marshall, T. Crawford, T.R. Lundquist, P. Vedagarbha, K. Erington, D. Bodoh, D.T. Reid
págs. 62-66
págs. 67-69
págs. 70-77
págs. 78-83
Atmospheric corrosion resistance of electroplated Ni/Ni–P/Au electronic contacts
Vinod K. Murugan, Zhigang Jia, Govindo J. Syaranamual, Chee Lip Gan, Yizhong Huang, Zhong Chen
págs. 84-92
Pulse plated silver metallization on porosified LTCC substrates for high frequency applications
Frank Steinhäußer, Armin Talai, Gabriela Sandulache, Robert Weigel, Alexander Koelpin, Wolfgang Hansal, Achim Bittner, Ulrich Schmid
págs. 93-100
Improvement of reliability for high-ohmic Cr–Si thin film resistors in a heat and humid environment: Removing moisture source by electrocatalytic decomposition of water
X. Y. Wang, Q. Cheng, X.P. Ma, H. Zhang, M.X. Li, T.N. Chen, G.P. Zhang, J.Q. Shao
págs. 101-108
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págs. 116-125
págs. 126-134
Flux effect on void quantity and size in soldered joints
D. Bušek, K. Dušek, D. Růžička, M. Plaček, P. Mach, J. Urbánek, J. Starý
págs. 135-140
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KITO tool: A fault injection environment in Linux kernel data structures
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